Chemical Vapor Deposition (CVD) Market Analysis 2017-2025 – Focus on Microelectronics, Data Storage, Solar Products, Cutting Tools & Medical Equipment – Research and Markets

October 12, 2017

DUBLIN–(BUSINESS WIRE)–The "Chemical
Vapor Deposition (CVD) Market Analysis by Category, by Applications
(Microelectronics, Data Storage, Solar Products, Cutting Tools, Medical
Equipment), by Region and Segment Forecasts, 2014 – 2025"
report has been added to Research and Markets' offering.

The global chemical vapor deposition (CVD) market is expected to reach
USD 48.01 billion by 2025

Globally increasing demand from semiconductor industry has been a major
factor driving industry growth. Also, growing consciousness regarding
the benefits of these products along with consumer preference for modern
and durable electronic devices has resulted in increased utilization CVD
coatings in various applications.

CVD technology is employed for producing high-performance solid
materials mainly to manufacture thin films for the semiconductor
industry. In this process, the wafer/substrate comes in contact with a
volatile precursor that reacts to form different types of deposits such
as pyrolytic coatings, also referred to as hard coatings.

CVD coatings are generally deposited at higher temperatures and exhibit
strong adhesion to glass surfaces. The volatile precursors for the
process include halides (TiCl4, TaCl5, WF6), hydrides (SiH4, GeH4, and
ammonia), metal organic compounds (metal alkyls/alkoxides/
dialylamides/diketonates/carbonyls), and others (ligands and complexes).

In the current scenario, industry players are focusing on developing
processes for hybrid thin inorganic-organic deposition films to lower
the production costs, thereby driving the semiconductor industry. This
trend has led to increased and tighter supply of titanium compounds in
compliance with environmental norms.

CVD equipment was the largest category in 2016 and is expected to
maintain a relatively average growth rate over the forecast period owing
to good quality of deposition films obtained from the equipment. CVD
services segment is the fastest growing chemical vapor deposition
segment owing to technological advancements in technologies such as
plasma enhanced process, hot-wire and combustion based.

Key players including Veeco Instruments, Inc., Ulvac, Inc., IHI
Corporation, Applied Materials Inc. Tokyo Electron Limited and Adeka
Corporation dominates the global market in 2016 with major market share.

Key Topics Covered:

Chapter 1. Methodology and Scope

Chapter 2. Executive Summary

Chapter 3. Chemical Vapor Deposition (CVD) Industry Outlook

Chapter 4. Chemical Vapor Deposition (CVD): Category Outlook

Chapter 5. Chemical Vapor Deposition (CVD): Application Outlook

Chapter 6. Chemical Vapor Deposition (CVD): Regional Outlook

Chapter 7. Competitive Landscape

Chapter 8. Company Profiles

  • Adeka Corporation
  • Aixtron SE
  • Applied Materials Inc.
  • ASM International NV
  • IHI Corporation
  • Lam research Corporation
  • Plasma-Therm
  • Denton Vacuum LLC
  • Richter Precision Inc.
  • Tokyo Electron Limited
  • Veeco Instruments Inc.
  • Ulvac Inc.
  • Intevac, Inc.
  • CVD Equipment Corporation

For more information about this report visit https://www.researchandmarkets.com/research/7f93pt/chemical_vapor

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